Excimer Laser Gas

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  F2 N2 Gas Mixture Gas

  10%F2+90%N2 introduction If you are looking for 10%F2+90%N2, Yuantong excimer laser gas will be your best choice, we will provide you with the best quality products and services. Sincerely welcome you to buy our products. Product Specifications CAS No.:7782-41-4/7727-37-9...

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  Fluorine in Nitrogen Gas Mixtures Nitrogen Fluorine Compounds

  20%F2+80%N2 introduction If you are looking for 20%F2+80%N2, Yuantong excimer laser gas will be your best choice, we will provide you with the best quality products and services. Sincerely welcome you to buy our products. Product Specifications State:Gas CAS...

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  Krypton Neon Mixtures Krypton Fluoride Mixtures（Kr＆F2）

  Krypton Neon Mixtures (Kr & Ne) Introduction Krypton Neon Mixtures are used in 248nm lithography applications, usually in conjunction with a halogen gas mixture.Krypton is a rare atmospheric gas which is odorless, colorless, tasteless, nontoxic, monatomic and chemically...

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  Argon Neon Premix Gases Argon Neon Mixtures

  Argon Neon Mixtures (Ar & Ne) introduction Argon Neon Mixtures are used in 193nm lithography applications, usually in conjunction with a halogen gas mixture.If you are looking for Argon Neon Mixtures (Ar & Ne),Yuantong excimer laser gas will be your best choice, we...

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  H2 Argon Mixture

  2%H2+98%Argon introduction Yuantong high-pressure seamless steel Argon Gas Cylinder Used are transportable high-pressure vessels.It is ideal for holding compressed gases and high pressure liquefied gases of argon,oxygen,hydrogen and other gases.We designed and produced...

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  Hydrogen Chloride Mixtures Xenon Laser Gas Mixtures

  Hydrogen Chloride Mixtures (HCL& Ne) introduction Hydrogen Chloride Mixtures are used in 308nm lithography applications. The Hydrogen Chloride Mixtures,etc excimer laser is widely used in isotope separation, photochemistry, medicine, biology, microelectronics industry,...

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  Krypton Fluoride Mixtures

  Krypton Fluoride Mixtures (Kr & F2) introduction Krypton Fluoride Mixtures are used in 248nm lithography applications, usually in conjunction with an inert gas mixture. For Excimer Laser Mixtures, there are several combinations of gases depending on the intended use. Some...

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  Argon Fluoride Mixtures

  Argon Fluoride Mixtures(Ar&F2) introduction Argon Fluoride Mixtures are used in 193nm lithography applications, usally in conjunction with and inert gas mixture.For Excimer Laser Mixtures, there are several combinations of gases depending on the intended use. Some are...